|
Ang, K. H., Chong, G. and Li, Y. (2005), “PID Control System Analysis, Design, and Technology,” IEEE Transactions on Control Systems Technology, Vol. 13, No. 4, pp. 559-576. Åström, K. J. (1970), Introduction to Stochastic Control Theory, Academic Press, San Diego. Åström, K. J. and Hägglund, T. (1995), PID Controllers: Theory, Design and Tuning, 2nd ed., Instrument Society of America, N.C. Bode, C.A., Ko, B.S. and Edgar, T.F. (2004), “Run-to-Run Control and Performance Monitoring of Overlay in Semiconductor Manufacturing,” Control Engineering Practice, Vol. 12, No. 7, pp. 893-900. Box, G. E. P. and Jenkins, G. M. (1976), Time-series Analysis— Forecasting and Control, new ed., Holden-Day, Oakland. Box, G. E. P. and Luceño, A. (1997), “Discrete Proportional-Integral Adjustment and Statistical Process Control,” Journal of Quality Technology, Vol. 29, No. 3, pp. 248-260. Brink, M. A., de Mol, C. G. M. and George, R. A. (1988), “Matching Performance for Multiple Wafer Steppers Using an Advanced Metrology Procedure,” Proceedings SPIE: Integrated Circuit Metrology, Inspection, and Process Control II, Vol. 921, pp.180-197. Butler, S.W. and Stefani, J.A. (1994), “Supervisory Run-to-Run Control of a Polysilicon Gate Etch Using in Situ Ellipsometry,” IEEE Transactions on Semiconductor Manufacturing, Vol. 7, No. 2, pp. 193-201. Castillo E. D. (1996), “A Multivariate Self-Tuning Controller for Run-to-Run Process Control under Shift and Trend Disturbances,” IIE Transactions, Vol. 28, No. 12, pp. 1011-1021. Castillo, E. D. (2000), “A Variance-Constrained Proportional-Integral Feedback Controller that Tunes Itself,” IIE Transactions, Vol. 32, No. 6, pp. 479-490. Castillo E. D. (2002), Statistical Process Adjustment for Quality Control, John Wiley & Sons, New York. Castillo E. D. and Hurwitz A. M. (1997), “Run-to-Run Process Control: Literature Review and Extensions,” Journal of Quality Technology, Vol. 29, No. 2, pp. 184-196. Castillo, E. D. and Yeh, J. Y. (1998), “An Adaptive Run-to-Run Optimizing Controller for Linear and Nonlinear Semiconductor Processes,” IEEE Transactions on Semiconductor Manufacturing, Vol. 11, No. 2, pp. 285-295. Chien, C. F., Chang, K. H., and Chen, C.P. (2003), “Design of a Sampling Strategy for Measuring and Compensating for Overlay Errors in Semiconductor Manufacturing,” International Journal of Production Research, Vol. 41, No. 11, pp. 2547-2561. Chien, C. F. and Hsu, C. Y. (2009), “UNISON Analysis to Model and Reduce Step-and-Scan Overlay Errors for Semiconductor Manufacturing,” Journal of Intelligent Manufacturing, in press. Clarke, D.W. and Gawthrop, P.J. (1975), “Self-Tuning Controller,” Proceedings of the Institution of Electrical Engineers, Vol. 122, No. 19, pp. 929-934. Guo, R. S. and Sachs, E. (1993), “Modeling, Optimization and Control of Spatial Uniformity in Manufacturing Processes,” IEEE Transactions on Semiconductor Manufacturing, Vol. 6, No. 1, pp. 41-57. Ingolfsson, A. and Sachs, E (1993), “Stability and Sensitivity of an EWMA Controller,” Journal of Quality Technology, Vol. 25, No, 4, pp. 271-287. Janakiram, M. and Goernitz, S. (2005), “Real-Time Lithography Registration, Exposure, and Focus Control—A Framework for Success,” IEEE Transactions on Semiconductor Manufacturing, Vol. 18, No. 4, pp. 534-538. Levinson, H. J., Preil, M. E. and Lord, P. J. (1997), “Minimization of Total Overlay Errors on Product Wafers Using an Advanced Optimization Scheme,” Proceedings of SPIE: Optical Microlithography X, Vol. 3051, No. 362, pp.362-373. Ljung, L. and Söderström, T. (1983), Theory and Practice of Recursive Identification, MIT Press, Cambridge. Maragah, H.D. and Woodall, W. H. (1992), “The Effect of Autocorrelation on the Retrospective X-Chart,” Journal of Statistical Computing and Simulation, Vol. 40, No. 1, pp. 29-42. Montgomery, D. C. (2005), Design and Analysis of Experiments, 6th ed., Wiley, New York. Moore, G. E. (1965), “Cramming More Components onto Integrated Circuits,” Electronics, Vol. 38, No. 8, pp. 114–117. Moden, P.E. and Söderström, T. (1982), “Stationary Performance of Linear Stochastic Systems Under Single Step Optimal Control,” IEEE Transactions on Automatic Control, Vol. 27, No. 1, pp. 214-216. Mozumder, P. K. and Barna, G. C. (1994), "Statistical Feedback Control of a Plasma Etch Process,” IEEE Transactions on Semiconductor Manufacturing, Vol. 7, No. 1, pp. 1–11. Narendra, A., Carson, S. and Morrison, C. (2003), “Exposure-Focus Critical Dimension Feedback Control in 300mm Manufacturing Technologies,” Proceedings of SPIE, Vol. 5044, No. 83, pp.362-373. Sachs, E., Guo, R. S., Ha, S. and Hu, A. (1991), “Process Control System for VLSI Fabrication,” IEEE Transactions on Semiconductor Manufacturing, Vol. 4, No. 2, pp. 134-143. Shewhart, W. A. (1931), Economic Control of Quality of Manufacturing Product, Princeton, New Jersey. (引自:Montgomery, D. C. (2008), Introduction to Statistical Quality Control, 6th ed., Wiley, New York.) Smith, T.H. and Boning, D. S. (1998), “Run by Run Advanced Process Control of Metal Sputter Deposition,” IEEE Transactions on Semiconductor Manufacturing, Vol. 11, No. 2, pp. 276–284. Smith, C. A. and Corripio, A. B. (2006), Principles and Practice of Automatic Process Control, 3rd ed., Wiley, New Jersey. Tseng, S. T., Yeh, A. B., Tsung, F. and Chan, Y. Y. (2003), “A Study of Variable EWMA Controller,” IEEE Transactions on Semiconductor Manufacturing, Vol. 16, No. 4, pp. 633-642. Xiao H. (2001), Introduction to Semiconductor Manufacturing Technology, 1st ed., Pearson Education, New Jersey. Zant, P. V. (2000), Microchip Fabrication : A Practical Guide to Semiconductor Processing, 4th ed., McGraw-Hill, New York.
|